The Materials for Opto/Electronics Research and Education (MORE) Center at Case Western Reserve University is home to several deposition capabilities.
Physical Vapor Deposition
Angstrom Engineering Evovac Deposition System
The Evovac consists of five sources; two thermal evaporation sources, an electron beam source, and two sputtering sources (DC & RF). Deposition capabilities include a wide range of metals and oxides. The thermal and electron-beam sources can be run simultaneously, allowing the co-deposition of up to three materials. The system is equipped with a sample stage heater capable of heating the sample holder plate to 600 degrees Celsius. Shadow masks are also available. Please inquire for our full range of depositable materials.
Chemical Deposition
Spin Coater with Fragment Adapter
Spin coating involves dissolving a material of interest in a solvent, placing the mixture on a substrate, and then spinning the substrate very quickly to achieve a uniform, defect-free thin or thick film. The MORE Center has three Laurell Technologies spin coaters located in the solvent glovebox, bench top, and clean room, allowing for the deposition of a variety of materials, including air sensitive polymers and photoresists.
Sample Cleaning and Processing
- Reactive Ion Etcher (RIE): Plasma Etch PE-100-RIE RIEs produce a high intensity plasma for plasma cleaning or etching and reactive ion etching to remove material and affect surface chemistry. This model includes both isotropic and isotropic etching. Ar, O2, SF6, and CF4 gas processes are available.
- Rapid Thermal Annealer (RTA): Ulvac-Riko Mila 5000 RTAs apply high heat to semiconductors, ferroelectrics, and other devices to repair defects, and improve mechanical and electrical properties. This model heats at up to 50°C/s and can anneal at up to 1200°C. Vacuum, H2/N2, H2/Ar, and N2 gas processes are available.
- UV-Ozone Cleaner: Novascan PSDP-UV8T UV-Ozone cleaners produce high intensity UV light and ozone gas to break up and remove complex molecules, cleaning a substrate. This model is also equipped with substrate heating to accelerate cleaning.
- Silane Chemistries: Our solvent glovebox is equipped with the necessary facilities for silane-based surface functionalization.